Single layer h-BN (Boron Nitride) film grown on copper foil: 2" x 1"

Single layer h-BN (Boron Nitride) film grown on copper foil: 2" x 1"

Single layer h-BN (Boron Nitride) film grown on copper foil: 2" x 1"

Single layer h-BN (Boron Nitride) film grown in copper foil.

h-BN is an insulator with a direct band gap of 5.97 eV. Due to its strong covalent sp2 bonds in the plane, the in-plane mechanical strength and thermal conductivity of h-BN has been reported to be close to that of graphene. h-BN has an even higher chemical stability than graphene; it can be stable in air up to 1000 C (in contrast, for graphene the corresponding temperature is 600 C).

During Chemical Vapor Deposition, BN is grown on both sides of the copper foil

Specifications:

  • Close to complete coverage (90-95%), with some minor holes
  • Thickness of the copper foil is 20 microns
  • High crystalline quality, see SAD (Selected area [electron] diffraction) data
  • Quality is confirmed by TEM. TEM shows perfect hexagonal structure.
  • TEM image of perfect hexagonal structure

    TEM Thin Film



    On SEM image (below), BN is seen as wrinkles on top of the copper foil.

    SEM Thin Film



    SAD data of h-BN

    SAD Data

    If transferred onto an SiO2 substrate, the BN film may be seen as a white film. However, it is difficult to recognize the BN film on copper using a microscope.

    Absorbance data BN on copper

    SEM Thin Film

    Transfer: PMMA Procedure, similar to that of graphene. It may be transferred on most substrates, which we may do in-house as custom work.

    Academic References:

    Ki Kang Kim, et. al. Synthesis of Monolayer Hexagonal Boron Nitride on Cu Foil Using Chemical Vapor Deposition. Nano Lett., 2012, 12 (1), pp 161166

    Ki Kang Kim, et. al. Synthesis and Characterization of Hexagonal Boron Nitride Film as a Dielectric Layer for Graphene Devices, ACS Nano, 2012, 6 (10), pp 85838590

     
    SKU CVD-2X1-BN
     
    $275.00
     
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